Device functions:
Laser cleaning is the process of removing material from solid (or sometimes liquid) surfaces by shining a laser beam. At low laser flux, the material surface attachment is heated and vaporized or sublimed by the absorbed laser energy, but the material itself is not affected. The depth at which the laser energy is absorbed, and the amount of material removed by a single laser pulse, depends on the optical properties of the material as well as the laser wavelength and pulse length. The total mass of each laser pulse ablated from the target is often referred to as the ablative rate. Laser cleaning can remove various types of pollutants on the surface of various materials to achieve a cleanliness that cannot be achieved by conventional cleaning. Moreover, it can also selectively clean the pollutants on the surface of the material without damaging the surface of the material, and the laser radiation characteristics such as the laser beam scanning speed and scan line coverage will significantly affect the cleaning process, and you can choose to manually load and unload or automatically load and unload
Application Industry:
Suitable for semiconductor assembly \3C\ microelectronics \ electronics industry
